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Tamjid Chowdhury
Research Areas
Electrochemistry,
role of additives and nanostructure of copper/carbon nanotube composites
for the damascene electroplating (3D interconnect) and synthesis of 1D
nanostructure by template deposition technique.
Education:
1. University
College Cork
(UCC), Ireland.
PhD student in Materials Chemistry
(Jan 2007-Present)
Intel funded project:
Electrodeposited Copper Composites for Advanced IC Interconnect
Supervisor: Dr. James Rohan, Research activity leader, Electrochemical
Deposition and Micropower, Tyndall National
Institute, Ireland.
2. University
of Limerick (UL), Ireland.
M.Sc. (by Research) in Materials
Physics (Jan 2004-June 2006)
Dissertation: Stress Evolution in
Electrodeposited Copper Metallization during Deposition and
Room-Temperature Aging
Supervisor: Prof. D. N. Buckley
(President of Electrochemical Society), Chair of Physics, Department of
Physics, University of Limerick,
Ireland.
3. Bangladesh
University of Engineering and
Technology (BUET), Bangladesh.
M.Sc. Engineering in Materials and
Metallurgical Engineering (April 2002- Jan 2004), First Class.
Thesis: Effect of Compositions and
Firing Cycle on the Properties of High Tension Ceramic Insulator
Supervisor: Prof. Fakhrul Islam, Department of Materials and
Metallurgical Engineering, BUET.
4. Bangladesh
University of Engineering and
Technology (BUET), Bangladesh.
B.Sc. Engineering in Metallurgical
Engineering (Dec 1996- April 2002), First Class, position 5th.
Current position
Jan 2007 - Present: Embark Initiative Intel Scholar, Microelectronics
Applications Integration Group (MAI), Tyndall
National Institute, Ireland.
Previous
Positions
Research Assistant, MSSI, University
of Limerick: Oct,2006 -
Dec,2006.
Researcher, National Materials
Research Institute (MTEC), Thailand. Aug-Oct 2003.
Teaching
Assistant, MME Department, BUET, Bangladesh
July,2002-July 2003.
Summery of the project
The introduction of Cu metallization below 22
nm technology min next generation integrated
circuits is involving a revolutionary change in process architecture for
multilevel interconnects. The conversion from Cu to Carbon nanotube
interconnects has introduced many new processes and materials into
semiconductor manufacturing. Electrodeposited copper
films for silicon chip interconnections are typically deposited at room
temperature by an energetically gentle process and may be considered metastable immediately after deposition. The grain size and texture of
copper film are known to be critical factors in determining the electromigration resistance as well as others
properties of copper interconnects. The instability and failure of copper
interconnect is due to grain growth, which is an important factor for
further minimization of chip size, The issue of electromigration
control of electroplated copper films by carbon nanotube has been a focus
of interest now a days. In this project copper is codeposited
with carbon nanotube.
Representative
Publications
T. Chowdhury, D. P. Casey, J. F. Rohan, ‘Additive influence on Cu nanotube
electrodeposition in anodised aluminium oxide templates.’ accepted in
Electrochemistry Communication, 2009.(Article in
Press).
M. Hasan, T. Chowdhury,
J. F. Rohan, ‘Cu2O Nanotubes as High
Performance Anode Materials for Li-ion Rechargeable Batteries’, ECS
Transactions Nanostructured Materials for
Energy Storage and Conversion, will be submitted soon.
M. Hasan, T. Chowdhury,
D. P. Casey, J. F. Rohan, ‘Electrochemical
properties of Cu deposition from methanesulfonate
electrolytes for ULSI and MEMS applications’, ECS Transactions
Electrochemical Processing in ULSI and MEMS 4, will be submitted soon.
T. Chowdhury, S. Ahmed, D. N. Buckley, M.T. Laugier, S. Nakahara and C. Heffernan, ‘Stress
Evolution in Electrodeposited Copper Metallization during Room-
Temperature Aging’, ECS Transactions Copper Interconnects, New Contact
and Barrier Metallurgies/Structures, and Low-k Inter-level Dielectrics
III, 1(11), 93, 2006.
Conference Presentations.
T. Chowdhury and J. F. Rohan,
‘Influences of carbon nanotubes on the electrodeposition of copper
interconnect’ submitted in E5 - Processing, Materials and Integration of
Damascene and 3D Interconnects, 216th ECS Meeting - Vienna, Austria,
2009.
M. Hasan, T. Chowdhury,
J. F. Rohan, ‘Cu2O Nanotubes as High
Performance Anode Materials for Li-ion Rechargeable Batteries’, abstract
no: 429, accepted for oral presentation in B7 - Nanostructured
Materials for Energy Storage and Conversion, 215th ECS Meeting - San
Francisco, CA, May, 2009.
M. Hasan, T. Chowdhury,
D. P. Casey, J. F. Rohan, ‘Electrochemical
properties of Cu deposition from methanesulfonate
electrolytes for ULSI and MEMS applications’, abstract no: 980.accepted
for oral presentation in F1 - Electrochemical Processing in ULSI and MEMS
4, 215th ECS Meeting - San Francisco, CA, May, 2009.
T. Chowdhury and J. F. Rohan,
‘Templated Cu/CNT nanoscale
composite electrodeposition.’ presented in 5th Intel Ireland Research
Conference, Sept, 2008.
T. Chowdhury, A. Panupat,
F. Islam, ’Effect of Firing Schedule on the properties of High Tension
Ceramic Insulator,’ 31st Cocoa Beach Conference & Exposition on
Advanced Ceramics and Composites, Florida,
Jan, 2007.
T. Chowdhury, S. Ahmed, M.T. Laugier, S. Nakahara, D.N Buckley, ‘Stress Evolution
in Electrodeposited Copper Metallization during Room- Temperature Aging’,
208th Electrochemical Society meeting (ECS), Los Angeles, CA, Oct, 2005.
A. Panupat, T. Chowdhury,
N. Vaneesorn, A. Thanaboonsombutt,
Md. Fakhrul Islam,
‘Influence of firing conditions on the microstructure of high tension
ceramic insulators’, 13th European Microscopy Congress (EMC), August,
2004.
T. Chowdhury, A. Panupat,
F. Islam, ‘Study on local clay for high tension ceramic insulator’, 2nd
International Conference on structure, processing & properties of
materials (SPPM), February, 2004.
T. Chowdhury, R. Chowdhury,
F. Islam, ‘Purification of local clay to make it suitable for ceramic
insulator’, The 2nd International Conference on Thermal Engineering
(BSME), Bangladesh,
January, 2004.
T. Chowdhury, M. T. Chowdhury,
F. Islam, ‘Development of Refining Techniques to Remove Free Silica and
Mobile Ion in Local Clays Making it Suitable for Ceramic Insulators.’ 2nd
International Conference on Materials for Advanced Technology (ICMAT), Singapore,
December, 2003.
Proceedings
T. Chowdhury, F. Islam and A. Panupat, ‘Study on local clay for high tension
ceramic insulator’, Proc. of the 2nd International Conference on
structure, processing & properties of materials (SPPM), 534, 2004.
T. Chowdhury and E. Haque,
‘Study on ceramic water filter’, Proc. of IEB Conference, Bangladesh,
2003.
Poster presentations
T. Chowdhury and J. F. Rohan,
‘Cu/CNTs Composite for Advanced IC Interconnect.’, poster presented in
Tyndall Postgraduate Poster Competition, 9th May, 2008.
T. Chowdhury and J. F. Rohan,
‘Cu/CNTs composite electrodeposition’, poster presented in 4th Intel
Ireland Research Conference, Sept, 2007.
Honours / Awards
Embark Initiative Intel Postgraduate Scholarship, Jan 2007-Present.
Awarded Student Membership of Electrochemical Society (ECS) and
Materials Research Society (MRS).
Travel Grant to attend 208th ECS conference, LA, 2005.
Postgraduate Scholarship, Jan 2004-Sept 2006, Science Foundation of Ireland (SFI), Ireland.
Research Grant Aug 2003-Oct 2003, MTEC National Science and Technology
Development Agency.
BUET Academic Scholarship, 1998-1999.
Equipment Expertise / Training
Jan 2007 - Present: Tyndall National Institute, Cork, Ireland.
Experience on
electrochemical measurement techniques: CH660B potentiostat
(for cyclic voltammetry, chromoamperometeory,
rotating disk electrode, microelectrode, and kinetic analysis)
Experience on the
electrodeposition of 1-D nanomaterials by
template synthesis technique
Electrical
characterization of thin film by four point probe technique
Structural
characterization of nanomaterials using FIB,
SEM and XRD
Electrodeposition (plating
line) of Cu, Ni, Sn.
Working on optical lithography,
pattern wafer and developing technique
Oct 2006 - Dec 2006: Materials & Surface Science Institute, Limerick, Ireland.
Trained on high
temperature x-ray diffraction (Philips X’pert
PRO MPD) and thermal analysis (DTA)
Jan 2004 - Sept 2006: Advanced
Metallization Group, University
of Limerick, Ireland.
Experience on thin film
deposition technique: Edwards E306 A Coating System
Experience and develop
difference types of stress measurement tools: lased based in situ stress
setup with NIST collaboration, optical fiber
stress system, FSM-8800 and Dektak surface
profilometry
Trained on nanoindentation (CSMTM nanohardness tester)
Aug 2003 - Oct 2003: National
Metal and Materials Technology Center (MTEC), Thailand.
Experience on optical ceramography & scanning electron microscopy with
energy dispersive x-ray
Trained on x-ray
florescence (XRF), vicker hardness tester,
bending tester and impedence analyzer
June 2001 - July 2001: Bangladesh
Insulator and Sanitation Factory (BISF), Bangladesh.
Experience on high
temperature ceramic furnace, tunnel kiln, bending strength tester,
dielectric tester and particle size analyzer
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